a) Fabricaton steps. SiO 2 is used as a hard mask for etching LN. Cr... | Download Scientific Diagram
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Shrinking Feature Size: Light Sources to OPC - An Introduction to Semiconductor Physics, Technology, and Industry
Semiconductor Process Materials|Semiconductor material: etc
생생한 반도체 이야기 – 미세패터닝 기술의 한계를 넘는 더블 패터닝 기술(2) — Steemit
The investigation of DARC etch back in DRAM capacitor oxide mask opening
Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect
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硬掩模Hard Mask (HM)
Sublithographic patterning technology: photoresist ashing-hard mask... | Download Scientific Diagram
Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering
Etch mechanism of an Al2O3 hard mask in the Bosch process - ScienceDirect
Spin-on Dual Hard Mask Material | JSR Micro NV
Lego like silicon electronics fabricated with hybrid etching masks
Novel Spin-on Carbon Hardmasks
Etch Overview
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硬掩模Hard Mask (HM)
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Low Stress TiN as Metal Hard Mask for Advance Cu-Interconnect
OptiStack® Multilayer Lithography | Brewer Science
28nm Metal Hard Mask etch process development | Semantic Scholar
Micromachines | Free Full-Text | A Magnetic Metal Hard Mask on Silicon Substrate for Direct Patterning Ultra-High-Resolution OLED Displays
Fabrication flow of the device. (a) Hard mask definition. (b) ICP-DRIE.... | Download Scientific Diagram
Fullerene-based spin-on-carbon hardmask - ScienceDirect
Use of oxide hard mask for patterning low-κ dielectric. | Download Scientific Diagram
Electronics | Free Full-Text | Step Coverage and Dry Etching Process Improvement of Amorphous Carbon Hard Mask
